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Gas:
Special gas and general industrial gas supply for semiconductor industry
Gases:
Dislane-Si2H6
Description
• CAS No.1590-87-0
Applications
• Semiconductor gas
Germain - Pure GeH4/GeH4 Mix:
41ggit-1121
Description
• 10% GERMAIN in H2
• CAS No. 7782-65-2, UN No. 1954, EU No.231-961-6
Applications
• Semiconductor Gas
Propylene Oxide Balance Blend - C3H6:
Description
• Flammable Liquid, N.O.S.; 3 (Flammable); UN 1993
Applications
• General Industrial, Synthetic & Analytical chemistry.
1, 3 Hexachlorobutadiene- C4F6:
xlItgit2-21
Description
• Liquefied gas, toxic, flammable, N.O.S. Gas products suppliers
Applications
• HFB is used for critical dimension dielectric etch applications.
• Higher Si02 etch rates can be achieved with better selectivity.
• HFB is a colorless, odorless, and flammable liquefied gas.
Perfluoro propane - Octaftuoropropane - C3F8:
igigict2-21
Description
• Halocarbon 218 (PerRuoropropane)(C3F8) is a colorless, nonflammable, nontoxic gas which is relatively stable and has a faintly sweet odor.
• Halocarbon 218 is shipped as a liquefied gas under its Own vapor pressure (100 pig @ 70° F).
Applications
Halocarbon 218 is used for plasma etching. The chemical composition of Halocarbon 218 supplies a higher ratio of Fluorine to Carbon than any of the other Halocarbon gases supplied by Electronic Fluonxarbons LLC. When Halocarbon 218 is exposed to the RF field generated in the etch process, a gas plasma is produced that will etch Silicon Dioxide or Silicon Nitrite with excellent selectivity. Gas product manufacturer in Korea
Surface Treatment Pigments
• Surface treated inorganic pigments for cosrn cs
• Various effects with a variety of surface treatment methods
• Increased safety in formulations
• Less cohesion in inorganic pigments
• Enhanced pigments and their texture
• Improved moisturizing effect
• Sebum control
• Protection against discoloration of cosmetics